3D Structuring in Nanotechnology

The operating principle of the new lithography process, which is suitable for all commercially available photoresists, is easily understood: Ultrashort laser pulses are strongly focused into the material, which is then exposed by means of a nonlinear optical process in the focal point. Like a pen that is moved in three dimensions, the laser beam writes on the material following arbitrary paths. It is thus possible to achieve track widths from several micrometers down to 150 nm. Two-dimensional 2D structuring or 21/2D structuring with surface profiles are, of course, also possible and have a resolution which is significantly higher than that allowed by conventional instruments up to now.